Abstract

The effect of an electric field (detached electrodes) on the crystal orientation of zinc oxide thin film was investigated. Two methods, direct and indirect, were utilized to produce zinc oxide thin films. In the direct method (reactive evaporation) oxygen was introduced into the zinc vapour stream and ZnO films were deposited on cold substrates in a vacuum system. Parallel electric fields were applied during the reaction process. It was observed that the electric field had no effect on the preferred c-axis orientation of the ZnO crystals. There was no significant difference in the crystal size or surface texture of ZnO samples subjected to electric fields with respect to the sample that experienced no electric field. In the indirect method (oxidation) electric fields were applied during the evaporation of zinc then the samples were oxidized in air in a furnace at 600 ‡C. Here the application of electric field improved the c-axis orientations. The crystal size remained unchanged, but the surface morphology was affected by the application of the electric field. Whenever the c-axis orientation improved, crystals on the surface became rounded and a more ordered microstructure was observed.

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