The Effect of Magnetron Pulsing on the Structure and Properties of Tribological Cr-Al-N Coatings

Abstract

The paper will discuss the effect of pulsing single or two unbalanced magnetrons in a closed magnetic field configuration on the structure and properties of tribological Cr-Al-N coatings. Nanocrystalline Cr-Al-N coatings were reactively deposited from Cr and Al elemental targets using two unbalanced magnetrons, which were powered in both dc, pulsing only Al target and asynchronously pulsing both Cr and Al targets at 100 kHz and 50% duty cycle conditions. The ion energy distributions of these deposition and pulsing conditions were characterized using a Hiden Electrostatic QuadruPole Plasma Analyzer. It was found that pulsing two magnetrons asynchronously at 100 kHz and 50% duty cycle produced higher ion energies and significant increased ion fluxes than pulsing none or pulsing only one (Al) target. The structure and properties of Cr-Al-N coatings synthesized under different dc and pulsing conditions were investigated using X-ray diffraction, scanning electron microscopy, nanoindentation and ball-on-disk wear test, and were correlated with the effects of ion energies and ion flux regimes observed in the plasma diagnostics. The advantages of using pulsed magnetron sputtering producing different energetic ion regimes to enhance the ion bombardment on the growing films and therefore achieving the improved density, refinement of grain size and properties are illustrated.