The Effect of Magnetic Field Distribution on Material Removal in Magnetic Compound Fluid Wheel Polishing

Abstract

A new polishing tool named magnetic compound fluid(MCF) wheel is proposed and the experimental apparatus is developed in order to polish optical glass efficiently and precisely.The theoretical analysis of the magnetic field distribution in the circumference surface of the MCF wheel is carried out using scalar magnetic potential method and vector superposition theorem.The analytical expression is verified by the actual magnetic field distribution measured with digital teslameter.According to Preston equation,the relation of the material removal with the magnetization pressure is discussed.The polishing characteristics of fused silica glass are experimentally investigated the effect of magnetic field distribution on material removal.The maximum depth are 13 m and 8 m after polishing for 120 min with the magnetic pole arrangement of NS-SN distribution and NS-NS distribution respectively,and little work materials are removed at the central areas with NS-NS pole distribution.It can be concluded that the higher material removal can be obtained by the MCF wheel with the magnetic pole arrangement of NS-SN distribution.