The effect of ion sputtering of silicon substrates on the catalyst morphology and growth of carbon nanotube arrays

Abstract

Polished Si substrates are sputtered by He + ions, and carbon nanotube arrays are prepared on the Fe-coated substrates by heat chemical vapor deposition from acetylene. Scanning electron microscopy and atomic force microscopy are employed to examine the morphologies of sputtered substrates, catalyst and carbon nanotube arrays. It is found that ion sputtering is effective in increasing the roughness of Si substrates, and helpful in obtaining higher density Fe catalyst particles and better-aligned carbon nanotube arrays.