Abstract
A detailed study has been performed of diamond-like carbon films containing high concentrations of phosphorus deposited onto a variety of substrates. These ‘amorphous carbon phosphide’ films have been grown using RF plasma CVD at varying ion impact energies by changing the DC self bias on the powered electrode. X-ray photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS) have been used to determine changes in the chemical composition and chemical bonding structure of these films. UV/visible absorption spectroscopy employing the Tauc-plot method has determined the band gap change with varying ion energies. Results show the enhancement of CP bonding ratios with deposition under high average ion energies, and also with the dramatic reduction in contaminant elements (O, H).
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