Abstract
A technique for the formation of the quasi-porous structure of a Ti surface with craters that are formed by helium blistering was developed. It was found that the quasi-pores with a size of 10–50 μm were formed on the Ti surface because of flaking and exfoliation of blister domes under the implantation of He+ ions with an accelerating voltage of 100–200 kV and implantation fluence of 6 × 1017–6 × 108 cm–2. A subsequent irradiation with Ar+ ions in a carbon dioxide medium led to an increase in the microhardness of the quasi-porous Ti by 20–30%. The maximum increase in the microhardness was observed for the Ar+ ion fluence of 2 × 1016 cm–2. It was shown that the fatigue strength of the Ti with the quasi-porous surface that was formed by the He+ implantation depended on the fluence of Ar+ ions and also had the maximum value at the fluence of 2 × 1016 cm–2. The results obtained are explained by ion-induced modification of the structure and composition of the surface layers. In vivo experiments showed that the Ti implants with double implantation of He+ and Ar+ ions had enhanced biocompatibility and high osseointegration capacity of the surface.
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