Abstract

Chemical spray pyrolysis technique was used at temperature 250˚C with annealing temperature at 400C˚( for 1hour) to deposition tungsten oxide thin film with different doping concentration of Au nanoparticle (0, 10, 20, 30 and 40) wt.% on glass substrate with thickness about 100 nm. The structural and electrical properties were investigated. The structure properties shows that the films at substrate by x-ray diffraction (XRD) temperature (250˚C) was amorphous structure while at annealing temperature have a polycrystalline structure with the preferred orientation of (200) , all the samples have a hexagonal structure for WO3 and Au gold nanoparticles have a cubic structure .The mechanisms of dc-conductivity of un-doped WO3 and doped with Au (10,20,30 and 40) wt.% thin films at the range (303 to 473) K have been discussed , there is decrease in conductivity with the increase in the doping concentration and hall measurements show that all films have a negative hall coefficient and nH increases with the increase of Au dopant ratio and decreasing in carrier mobility (μH) with increasing of Au .

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call