The effect of fluoride on the electrochemical behavior of Ti and some of its alloys for dental applications

Abstract

AbstractTitanium is the best metal for making dental implants and restorations. In the last decade, new titanium alloys have been developed in different areas of dentistry. Concurrently, treatments using fluoride supplementation, such as odontology fluoride containing gels, have also been widely used in odontology.The aim of this study is to investigate the electrochemical behaviour of a new titanium alloy containing Cu and Ag, in fluoride‐containing media, and compare it with the behavior of Ti and Ti6Al4V, which are used frequently as biomaterials. Open circuit potential, polarization resistance and electrochemical impedance spectroscopy measurements revealed that the corrosion resistance of titanium and its alloys is controlled by the fluoride ion concentration and the pH of the solution. The presence of F− ions in neutral solution does not hinder the formation of a protective layer of Ti and its alloys. Thus, the corrosion resistance of Ti is maintained in this medium. However, the corrosion of Ti and its alloys are enhanced in an acidic environment, because F− ions in the solution combines with H+ ion to form HF, even in low fluoride concentration.