The effect of deposition parameters on radiofrequency sputtered molybdenum thinfilms

Abstract

Employing r.f. (radiofrequency) magnetron sputtering, molybdenumthin films were fabricated on soda-lime glass substrates for use inCu(In,Ga)Se2 based solar cells. The physical, electrical and structural properties of the films were studiedas a function of two deposition parameters: argon pressure and r.f. power. The strainreversal from tensile to compressive occurs at high pressure and is found to decrease withincreasing applied r.f. power. The grain sizes of films deduced from x-ray diffractionmeasurements (full width at half-maximum), and consistent with atomic force microscopeimages, increase with increasing argon pressure and power. The resistivity of the films wasfound to increase with increasing argon pressure and decrease with increasing r.f. power.