Abstract
TiO2 thin films were prepared on fused quartz by the liquid-phase deposition (LPD) method from a (NH4)2TiF6 aqueous solution upon addition of boric acid (H3BO3) and calcined at various temperatures. The as-prepared films were characterized with thermogravimetry (TG), Fourier transform infrared spectra (FTIR), X-ray diffraction (XRD), UV−Visible spectrophotometry (UV−Vis), scanning electron microscopy (SEM), photoluminescence spectra (PL), and X-ray photoelectron spectroscopy (XPS), respectively. The photocatalytic activity of the samples was evaluated by photocatalytic decolorization of methyl orange aqueous solution. It was found that the as-prepared TiO2 thin films contained not only Ti and O elements, but also a small amount of F, N, and Si elements. The F and N came from the precursor solution, and the amount of F decreased with increasing calcination temperature. Two sources of Si were identified. One was from the SiF62- ions, which were formed by a reaction between the treatment solution and quartz ...
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
