Abstract
NiO0.99Cu0.01 films have been deposited using thermal evaporationtechnique on glass substrates under vacuum 10-5mbar. The thicknessof the films was 220nm. The as -deposited films were annealed todifferent annealing temperatures (373, 423, and 473) K undervacuum 10-3mbar for 1 h. The structural properties of the films wereexamined using X-ray diffraction (XRD). The results show that noclear diffraction peaks in the range 2θ= (20-50)o for the as depositedfilms. On the other hand, by annealing the films to 423K in vacuumfor 1 h, a weak reflection peak attributable to cubic NiO wasdetected. On heating the films at 473K for 1 h, this peak wasobserved to be stronger. The most intense peak is at 2θ = 37.12o withthe preferential orientation of the films being (111) plane. The opticalproperties of the films have been studied. The effect of annealingtemperature on the optical parameters of NiO0.99Cu0.01 such astransmittance, reflectance, absorption coefficient, refractive index,extinction coefficient, and real and imaginary parts of dielectricconstant has been reported.
Highlights
Transition metal oxides likeNickel oxide are an attractive material which has lots of special properties such as optical, electrical and magnetic properties
NiO0.99Cu0.01 thin films prepared by thermal evaporation technique in order to study the optical constants, including refractive index, extinction coefficient, real and imaginary part of dielectric constant
The absorption coefficient (α) increases with the increasing of annealing temperatures
Summary
Transition metal oxides likeNickel oxide are an attractive material which has lots of special properties such as optical, electrical and magnetic properties. NiO0.99Cu0.01 thin films prepared by thermal evaporation technique in order to study the optical constants, including refractive index, extinction coefficient, real and imaginary part of dielectric constant.
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