Abstract
Nanostructured multilayers of TiB2/TiAlN at different modulation ratios (tTiB2:tTAlN) ranging from 1:24 to 6:1 were deposited onto Si(100) wafers by ion beam assisted deposition (IBAD). The multilayers were subsequently annealed in a vacuum environment at a temperature of 500°C for 30min, and then characterized by extensive measurements including X-ray reflection (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM), nano-indentation and surface profilometry. It was found that the mechanical properties of the multilayers were closely related to tTiB2:tTAlN. A maximum hardness of 37GPa was achieved at tTiB2:tTAlN of 1:18 for as-deposited TiB2/TiAlN multilayer. This hardest multilayer also showed the improved residual stress and fracture resistance. The hardness and elastic modulus of the multilayers increased significantly after annealing. The maximum hardness of the multilayer at tTiB2:tTAlN of 1:14 was up to 41GPa after annealing at 500°C.
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