Abstract

Properties of TiO/sub x/ film, prepared by atmospheric pressure chemical vapor deposition (APCVD) as an anti-reflective (AR) coating on silicon solar cells have been extensively investigated. The effect of film densification, after annealing at temperatures as low as 430/spl deg/C is the transition from amorphous to crystalline. This effect is found to be crucial to the large scale manufacturing of solar cells because of its cost effectiveness and simpler processing requirements. Results of heat treatment and the change in morphology is presented. The impact of annealing on Spheral Solar cell performance is also discussed.

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