Abstract
Aluminum doped zinc oxide (Al-doped ZnO) thin films were deposited by the spray pyrolysis technique onto the glass substrates at 450 °C using anhydrous zinc chloride (ZnCl 2 ) and aluminum chloride (AlCl 3 ) as sources of zinc and aluminum ions, respectively. The effect of [Al]/[Zn] ratio in the solution on the structural, optical, electrical and cathodoluminescence properties of these films were investigated. XRD study revealed that both undoped and Al-doped ZnO films were polycrystalline with hexagonal structure and exhibited (0 0 2) preferential orientation. The optical and electrical studies showed that the film deposited with the [Al]/[Zn] ratio equal to 0.05 had high transmittance (of about 80% and 95% in the visible and near infra-red regions, respectively) and minimum resistivity of 1.4×10 −3 Ω cm, respectively. This resistivity value decreased with increase in temperature indicating the semiconducting nature of Al-doped ZnO films. The chemical composition analysis (EPMA) showed that this film was nearly stochiometric with a slight oxygen deficiency.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
