Abstract
Polycrystalline diamond films were fabricated on copper substrates by a multi-step process comprised of physical vapor deposition of Al-based composite interlayer on Cu substrate and depositing continuous diamond film on composite interlayer by plasma assisted chemical vapor deposition (PACVD). The interface characteristics and adhesion strength were investigated by Auger electron spectroscopy, Raman analysis, calotest and indentation test. The results show that the continuous film without cracks is successfully obtained. The improved adhesion between diamond film and substrate results from the low residual stress in the film due to their compensation by Al interlayer in the sample cooling process.
Highlights
THE DYNAMIC SUBLAYERS FOR IMPROVING THE ADHESION OF CVD DIAMOND FILMS ON COPPER
Aluminum layer was used as the dynamic melting sublayer, copper layer was used as carbon diffusion barrier and Cr layer was used as «new» substrate for polycrystalline diamond film synthesis
The policrystalline diamond films obtained were characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD)
Summary
THE DYNAMIC SUBLAYERS FOR IMPROVING THE ADHESION OF CVD DIAMOND FILMS ON COPPER The dynamic sublayers for improving CVD diamond coatings adhesion on copper substrates have been used.
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