Abstract
The distribution of oxygen in submicron silicon powders produced by ultrafine grinding was studied as a function of grinding time, grinding liquid composition, air exposure during the grinding experiments and post-grinding handling. Grinding in isopropyl alcohol resulted in relatively low oxygen concentrations. Here, a maximum SiO2 oxide layer thickness of 0.24 nm was calculated for a product with a total oxygen concentration of 3.35 wt%, a mean particle size of 122 nm and a BET specific surface area of 72 m2/g. When excluding the contribution from adsorbed or trapped grinding liquid and alkoxy groups the layer thickness was reduced to 0.07 nm. The addition of ion exchange water to the isopropyl alcohol produced a non-linear increase in the oxygen concentration. The effect of exposure to air during drying was small compared to the effect of exposure to air during the grinding process or during heat treatment at higher temperatures.
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