Abstract
Advanced dioptric projection lenses from Carl Zeiss are used in some of the world’s most advanced deep ultraviolet projection lithography systems. These lenses provide a resolution of better than 100nm across the entire field of view with a level of aberration control that maximizes critical dimension uniformity and lithographic process latitude. These dioptric projection lenses are currently being used for critical layer device patterning for a wide array of complex logic, memory, and application specific integrated circuits.
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