Abstract
A non-destructive analytical method for oxygen in silicon by both helium-3 and α-particle activation analysis was applied to different samples, containing 0.05–10 p.p.m. of oxygen. The accuracy and precision of the method were studied. For concentrations above 1 p.p.m., the average coefficient of variation is about 6% for α-activation and 13% for helium-3 activation. For concentrations of about 60 p.p.b., the corresponding figure is about 20%. The results of both methods, which agree within 8%, are compared to infrared analysis. The determination limit of the method is 4 p.p.b. for helium-3 activation and 22 p.p.b. for α-activation.
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