Abstract

Insights into the spatio-temporally resolved electron power absorption dynamics in capacitively coupled radio-frequency plasmas are essential for understanding the fundamentals of their operation and as a basis for knowledge-based plasma process development. Similar to the γ-mode, an ionization maximum is observed at the sheath edge around the time of maximum sheath voltage in electronegative oxygen discharges at a pressure of 300 Pa. Based on Particle-in-Cell/Monte Carlo Collisions (PIC/MCC) simulations, we demonstrate that this maximum is not only caused by secondary electrons emitted at the electrode and collisionally multiplied inside the sheath. In fact, it also occurs in the complete absence of secondary electrons in the simulation, and is caused by the generation of O− ions by electron attachment close to the electrode during the local sheath collapse. These negative ions are accelerated towards the plasma bulk by the sheath electric field during sheath expansion. By electron detachment from these negative ions, electrons are generated inside the sheath and are accelerated towards the plasma bulk by the instantaneous sheath electric field—similarly to secondary electrons. Ionization is also observed in the plasma bulk and caused by electrons generated by detachment and accelerated by the high drift-and ambipolar electric fields. This detachment-induced electron power absorption is found to have significant effects on the discharge in the presence and absence of secondary electron emission. Its fundamentals are understood based on an analysis of the spatio-temporal electron and O− power absorption dynamics as well as the trajectory of selected O− ions close to the electrode.

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