Abstract
Abstract The degradation of ferroelectric properties of PZT films due to plasma damage were investigated. Hysteresis loop and leakage current of PZT films were measured before and after plasma exposure and plasma etching. The damage related defects equivalent to positive charge and neutral traps were introduced into PZT films. Recovery of the plasma damage required annealing at 550°C. The influence of deposition damage of SiO2 using TEOS-O3 also was investigated.
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