Abstract
An analysis is made, based upon differential atomic transport fluxes in a substrate resulting from implant ion collection, ballistically stimulated atomic relocation or mixing and surface sputtering, of the evolution of equivalent atom concentration-depth profiles in a substrate as a function of increasing ion flux. It is then shown how carefully controlled experimental studies of such profiles can be deconvoluted to determine interlayer atomic mixing probability distributions. The relevance of such an approach to sputter profiling of equivalent atom impurity profiles in a substrate is explored.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.