The Damage Threshold of Multilayer Film Induced by Femtosecond and Picosecond Laser Pulses

Yunzhe Wang,Luwei Zhang,Anmin Chen,Xiangzheng Cheng,Junfeng Shao,Changbin Zheng

doi:10.3390/coatings12020251

Abstract

Laser-induced damage threshold (LIDT) is an essential factor in measuring the anti-laser damage of optical films. The damage threshold and morphology of the Ta2O5/SiO2 multilayer film prepared by electron beam evaporation were studied by femtosecond (50 fs) and picosecond (30 ps) laser irradiations. The results showed that the LIDT of the film was 1.7 J·cm−2 under the femtosecond laser. The damage morphology developed from surface damage to a clear layered structure, and the outline has become more transparent and regular with an increase in the laser fluence. Under the picosecond laser irradiation, the LIDT of the film was 2.0 J·cm−2. The damage morphology developed from small range to thin film layer separation, and the outline changed from blurry to clear with an increase in laser fluence. Therefore, the LIDT of the film decreased with a decrease in the laser pulse width.

Highlights

In high-energy laser systems, there are a large number of optical film components, and the ability of these components to resist laser damage seriously affects the operation of the laser system
The results show that the laserinduced damage threshold (LIDT) of the multilayer film are
It was found that the LIDTs of multilayer film are 1.7 and

Summary

Introduction

In high-energy laser systems, there are a large number of optical film components, and the ability of these components to resist laser damage seriously affects the operation of the laser system. The research on the damage of these three typical pulse width lasers to optical thin film components is of great significance These studies can provide a theoretical and experimental basis for the rational use of different laser sources and further explore the application prospects of lasers. For this reason, the laser pulse width is an essential factor that can influence the LIDT of the optical film. The LIDT of the Ta2 O5 /SiO2 multilayer film by electron beam evaporation using fused silica as the substrate under femtosecond and picosecond lasers by one-on-one measurement was investigated. We discussed the damage mechanism of multilayer film under femtosecond and picosecond lasers

Sample Customization

Experimental Device

Laser Damage

Results and Discussion

Damage

Conclusions