Year-end Sale % OFF 
Abstract
The measurement of the correlation between the noise generators is a mandatory issue for the low-frequency noise modeling of bipolar transistors, and it is recognized as a very hard experimental task. In the present work, we introduce the concept of correlation resistance and we demonstrate that it can be usefully employed as a guideline for the low-frequency noise modeling in terms of intrinsic noise sources. As a proof of concept, the investigation technique is applied to submicron, BiCMOS-compatible Si/SiGe heterojunction bipolar transistors. It is pointed out that a satisfactory description of the transistor low-frequency noise behavior can be obtained by taking into account noise sources associated with surface recombination/fluctuation in the extrinsic base region.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
