Abstract
The most important quantity in magnetism is the magnetic anisotropy energy (MAE). Small MAE corresponds to soft magnets, good for transformers; large MAE corresponds to hard magnets, good for storage media. On a surface and nanometer scale LEED, MEED, X-ray and photoelectron diffraction, surface EXAFS and other techniques have recently made enormous progress in the determination of the real nearest neighbor distances and interlayer spacings within a tenth of an angstrom. These parameters serve as input for ab initio calculations of the MAE. Recent experiments on ultrathin Ni and Co films on Cu and W substrates will be discussed. We show that small displacements from ideal the fcc structure by only 2% may change the MAE by orders of magnitude! Thus for the first time the origin of the MAE in thin films can be understood on the basis of first-principles calculations taking into account the real local, i.e. noncubic perturbed, structure. This will result in an intimate contact between surface structure determination and magnetic properties.
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