Abstract
The effect of etching the electrode surface and of the deposition of submonolayer quantities of metal on the semiconductor electrode surface has been examined. The experimental observations show that the rate of reaction (H 2 evolution) is determined by the charge transfer rate across the metal-solution interface. Recent experiments also show that the photocorrosion of small band gap non-oxide semiconductor photoanodes can be prevented by depositing suitable conducting transparent coatings on the electrode surface. By using the electrocatalysed photocathodes and protected photoanodes, high efficiencies for the photoelectrolysis of water can be achieved.
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