Abstract
The contemporary situation and trends in the method of use of amorphous film crystallization and regrowth processes by pulse (laser, electron beam, light etc.) heating as well as their thermodynamic and kinetic characteristics are considered. An analysis is made of the processes of normal and accelerated (explosive or shock) crystallization of amorphous films (in the solid state) or regrowth (via the liquid phase) through a comparison of the waiting time for the appearance of the first nucleus and rate of crystallization. The directions of future progress in pulse annealing are discussed.
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