The chemisorption and decomposition of NO on the (110) surface of iridium

Abstract

The chemisorption of NO on Ir(110) has been studied with thermal desorption mass spectrometry (including isotopic exchange experiments), X-ray and UV-photoelectron spectroscopies, Auger electron spectroscopy,LEED and CPD measurements. Chemisorption of NO proceeds by precursor kinetics with the initial probability of adsorption equal to unity independent of surface temperature. Saturation coverage of molecular NO corresponds to 9.6 × 10 14 cm −2 below 300 K. Approximately 35% of the saturated layer desorbs as NO in two well separated features of equal integrated intensity in the thermal desorption spectra. The balance of the NO desorbs as N 2 and O 2 with desorption of N 2 beginning after the low-temperature peak of NO has desorbed almost completely. Molecular NO desorbs with activation energies of 23.4–28.9 and 32.5–40.1 kcal mole −1, assuming the preexponential factor for both processes is between 10 13–10 16 s −1. At low coverages of NO, N 2 desorbs with an activation energy of 36–45 kcal mole −1, assuming the preexponential factor is between 10 −2 and 10 cm 2s −1. Levels at 13.5, 10.4 and 8.5 eV below the Fermi level are observed with HeI UPS, associated with the 4σ, 5σ and 1π orbitals of NO, respectively. Core levels of NO appear at 531.5 eV [O(1s)] and 400.2 eV [N(1s)], and do not shift in the presence of oxygen. Oxygen overlayers tend to stabilize chemisorbed NO as reflected in thermal desorption spectra and a downshift in the 1π level to 9.5 eV.