The characteristics of magnetically enhanced large area processing plasmas

Abstract

Summary form only given, as follows. In order to improve production efficiency, large-diameter wafer substrates (300mm diameter) and large-area glass substrates(from 0.4 to 1 m/sup 2/) have been adopted recently. With the increased reactor size, the high density and good uniformity become more important. Generally, magnetically enhanced inductively coupled plasmas (MICP) have a higher plasma density for a given power deposition than ICP sources due to their high ionization efficiency and the increased power absorbing efficiency. To investigate the discharge phenomenon in the chamber that consists of embedded antenna coil in the rectangular system (1,020mm /spl times/ 830mm /spl times/ 437mm) with permanent magnetic arrays, we have developed a magnetized two-dimensional (2-D) fluid simulation model. We have used the Poisson Superfish to obtain 2-D realistic magnetic field. Depending on process conditions and the arrangement of magnets, the distribution of plasma parameters have many differences. The parameters, which affect non-uniformity, electron temperature, and others, can be explained in a manner similar to the inductively coupled plasma source with a cylindrical chamber. Our simulation results show that the high density and good uniformity plasma can be obtained in the embedded antenna coil system with a suitable magnetic arrangement. It is compared with the experiment.