Abstract
We study the effect of a hydrogen-plasma treatment at various temperatures on the roughness of a Si surface and the SiSiO 2 interface. Roughness measurements are made using scanning tunneling microscopy, profilometry and ellipsometry. Results of these different techniques are compared with one another.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
