The calculation of particle deposition efficiency due to inertia, diffusion and interception in a plane stagnation flow

Abstract

The particle deposition mechanism in a plane stagnation flow is investigated analytically and numerically. Particle deposition efficiency η TID is obtained theoretically by taking into account particle inertia, diffusion and interception. It is compared with various calculated deposition efficiencies, i.e. η T (due to inertia) + η I (due to interception) + η D (due to diffusion), η TI, (due to inertia and interception) + η D, etc. In the region where all of the three deposition mechanisms, i.e. inertia, interception and diffusion, act at the same time, real deposition efficiency η TID is not accurately expressed by η T + η I + η D. However, η TID is nearly equal to η TI + η D unless the interception parameter is zero. The calculated results of particle concentration indicate that a high concentration region is formed near the deposition plate, and that the concentration becomes higher as particle inertia increases.