Abstract
The [Co(1 nm)/Cu(2 nm)]N multilayers with different numbers of bilayer repetitions (N = 3 and 10) were thermally evaporated on Si(100) substrates with a small amount of Bi or Pb deposited only on the first and on the second Cu layer. The chemical composition of the surface after each step of the preparation process was studied by Auger electron spectroscopy. The evolution of the Auger peaks showed the segregation of Bi and Pb surfactants. During the evaporation of the subsequent Co and Cu layers, gradual decrease in the surfactant amount on the surface was observed. No appearance of Co peak on the Cu layer, and Cu peak on the Co layer even for a coverage of a few A indicates the layer continuity. The interface roughness of the surfactant-mediated Co/Cu layers analyzed by X-ray reflectometry (when surfactant was deposited twice) was similar to the pure Co/Cu samples. However, more repetitions of surfactant, by reduction of interface roughness, improve the layer quality.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
