Abstract
The beam application to nanoscience, especially next generation lithography producing the semiconductor devices, is expanded by so-called quantum beam technology. EUV (Extreme Ultraviolet) lithography is now evaluated to be the best solution of the next generation lithography for 22 nm node and beyond 22 nm node. Recent progress in the development of EUV lithography, especially resist processes and materials, is supported by many kinds of beam technology such as pulse radiolysis.
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Schedule a callMore From: The transactions of the Institute of Electrical Engineers of Japan.C
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