Abstract
A simplified analytical model for ion–solid interactions, appropriate for low-energy beam depositions, is presented to determine the analytic solution of the deposited energy in the solid. The deposited energy in the surface and the energy deposited in the underlying bulk, correlative to the atomic displacement leaving the lattice damage, are dependent on the mass and incident energy of projectiles as well as the sharp displacement threshold energy. The determination of deposited energy of ion in subsurface yields a ceiling for the beam energy above which more defects are generated in the bulk resulting in defective films. The accuracy of the angular average over the scattering cross section is evaluated from comparison with experimental results. The analytic solution is applied to Ar + and N + projectiles in diamond, graphite and SiC materials, respectively.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
