Abstract
The provision of composition-depth profiles using Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) is important in a number of commercially important applications. In this paper the techniques available to provide depth profiles over the depth range 1nm to 1nm are described. These include methods based on the variation in the escape depth, sputter-depth-profiling and taper-sectioning techniques (angle lapping and ball cratering). The areas of application of each technique are described and examples are given. The suitability of AES and XPS for each method is also discussed.
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