Abstract
Self-Assembly Monolayer (SAM) technique, as a novel and developing technique for fabricating layer-by-layer nanofilm on substrates of various sizes, shapes and materials, has received more and more attention in the areas of light-emitting devices, nonlinear optical materials, conductive films, permselective gas membranes, sensors, modification of electrodes, resistance and printing technique. In comparison with other traditional methods, SAM technique has many significant advantages, including simple process, universality, formation with densely packed, well defined, highly ordered surfaces. This paper will give a review on the recent development in SAM technique.
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