Abstract
Localized surface plasmons excited by Ag nanoparticles are introduced in the chemical etching process of silicon. A special crateriform structure with gradually varying radius is achieved by the surface electromagnetic field enhancement effect of localized surface plasmons resonance (LSPR). Theoretical analysis demonstrates that the formation kinetics of the crateriform structures conforms to the local electromagnetic field enhancement and forward scattering induced by LSPR. The LSPR assisted photocatalytic etching offers a potential approach for the preparation of the surface microstructures used in optoelectronic devices.
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