Abstract
A new technique of quartz c-axis fabric analysis is described. The technique is based on the direct correlation between the optic orientation of quartz grains in an aggregate and the changes in interference colours as a thin section of the aggregate is rotated on a microscope stage. Using monochromatic incident light the interference colour variations are measured by a photometer. The resulting transmission spectra are input to a computer program for analysis. The analysis depends upon the decomposition of large numbers of superpositions of transmission spectra for several observation planes of different orientation. A sequential decomposition procedure is described and comparisons are made between conventionally measured c-axis fabric patterns and patterns derived from this photometric analysis. The photometric method proves to be a creditable alternative to the other methods of fabric analysis with distinct advantages in some circumstaces.
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