The Amorphous Carbon Thin Films Synthesized by Gas Injection Magnetron Sputtering Technique in Various Gas Atmospheres

Abstract

This work presents the potential for using pulsed gas injection to produce amorphous carbon films. In this experiment, the frequency of injecting small amounts of gas was used to control the pressure amplitudes, thus achieving the conditions of plasma generation from stationary, through quasi-stationary, to pulsed oscillations of pressure. In addition, we used various gases and their mixtures, an alternative to argon. In the experiment, we studied the energy state of the plasma. The films were examined for phase and chemical composition, surface morphology, and optical and mechanical properties. We determined low-frequency pulsed gas injections to be conditions favorable for C(sp3)−C(sp3) bond formation. The plasma generated by gas injections is better ionized than that generated by static pressure. Pulsed conditions favor the plasma species to retain their kinetic energy, limiting the probability of intermolecular collision events. Since helium has a relatively high ionization energy, it is a practical addition to sputtering gas because of the increasing sp3 content in the films. The electrons created by helium ionization improve the plasma’s ionization degree.