Abstract
The adhesion stability of a film on its substrate is essential for enhancing and maintaining the protective performance of the film. In this study, titanium nitride (TiN) films were deposited on Mg alloy (ZM21) substrates with roughness values (Ra) of 200, 400, and 600 nm by magnetron sputtering. The effects of the substrate roughness on the film residual stress, adhesion strength, and wear resistance were studied. The results indicated that the residual stress of the film decreased as the substrate roughness increased. Adhesion is affected by a combination of the balance of film residual stresses and mechanical anchorage and the distribution of stresses on the rough surface. The TiN film on a substrate with a Ra of approximately 400 nm exhibited optimal adhesion strength. The wear resistance decreased with increasing Mg substrate roughness. Both the film residual stress and adhesion strength of the TiN film deteriorated after natural storage for 60 d, and the TiN film on the substrate with a Ra of 400 nm had optimal adhesion stability.
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