Abstract
AbstractDense ZnO films with a strong c‐axis texture have been deposited on transparent conductive oxide glass, glass, and Si wafers, respectively, with a two‐step pressureless wet chemical method using zinc acetate dihydrate as Zn‐precursor. The crystallographic structure of the films has been studied with XRD and scanning electron microscopy. Optical measurements reveal a high transparency of the ZnO films with a thickness of up to 10 μm. This new cost‐effective route for ZnO film deposition does not require expensive sophisticated equipment and is easily upscaled.
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