Abstract

Ti–Ni alloy thin plates and thin films were made by the rolling method and r.f. sputter-deposition technique, respectively. In order to apply these Ti–Ni shape memory alloy thin plates and thin films for microactuators, it is very important to know the crystallographic texture and clarify the planar anisotropy in shape memory strain. The texture was investigated by X-ray diffraction and crystallite orientation distribution functions (ODF) were measured. The rolled thin plates revealed a specific deformation or recrystallization texture depending on annealing temperature, while the thin films showed a uniform crystallite orientation distribution or a typical [110] fiber texture depending on sputtering condition. The transformation strain depended on direction on the specimen plane of the rolled thin plates, while it was almost the same irrespective of direction in the sputter-deposited thin films.

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