Abstract
The adsorption and reaction of tetrakis(dimethylamido)hafnium (TDMAH) on hydrogen terminated Si(100) were studied by using in situ attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR), transmission IR, and quadrupole mass spectrometry (Q-MS). Surface and gas phase reactions were investigated at temperatures between 25 and 300 °C. Density functional theory (DFT) calculations benchmarked by coupled cluster calculations on small models were performed for gas phase decomposition via intramolecular insertion and β-hydride elimination as well as the adsorption and reaction of TDMAH onto a hydrogen terminated Si(100) surface. N−Si and CH2−Si bonds due to reactions on the Si windows were observed in transmission IR, while N−Ge and CH2−Ge bonds on a Ge internal reflectance element (IRE) were observed by ATR-FTIR at 25 and 100 °C. Also observed were the formation of Hf−H bonds and three-member-ring species on the Si surface; the former was confirmed by a control D2O exchange reaction expe...
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
