Abstract
The design and fabrication technology of test objects in the form of slit-like grooves with a rectangular profile and certified widths in the range of 50–500 nm in silicon are described. Experimental results that substantiate sections of the technology of groove fabrication and confirm the basic properties of the produced structures are given. The test objects are intended for calibrating scanning electron microscopes (SEMs) and studying the mechanisms of SEM-image formation.
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