Abstract

Graphene has emerged as a promising material for infrared (IR) photodetectors and plasmonics. In this context, wafer scale epitaxial graphene on SiC is of great interest in a variety of applications in optics and nanoelectronics. Here we present IR reflectance spectroscopy of graphene grown epitaxially on the C-face of 6H-SiC over a broad optical range, from terahertz (THz) to mid-infrared (MIR). Contrary to the transmittance, reflectance measurements are not hampered by the transmission window of the substrate, and in particular by the SiC Reststrahlen band in the MIR. This allows us to present IR reflectance data exhibiting a continuous evolution from the regime of intraband to interband charge carrier transitions. A consistent and simultaneous analysis of the contributions from both transitions to the optical response yields precise information on the carrier dynamics and the number of layers. The properties of the graphene layers derived from IR reflection spectroscopy are corroborated by other techniques (micro-Raman and X-ray photoelectron spectroscopies, transport measurements). Moreover, we also present MIR microscopy mapping, showing that spatially-resolved information can be gathered, giving indications on the sample homogeneity. Our work paves the way for a still scarcely explored field of epitaxial graphene-based THz and MIR optical devices.

Highlights

  • IntroductionThere is no detailed experimental analysis of the optical reflection properties of epitaxial graphene in the THz-MIR ranges

  • Compared to experiments in the transmission mode[6,7,8,9,10,11,19]

  • We report an experimental study of the optical reflection of large area epitaxial graphene spanning a broad range of experimental parameters

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Summary

Introduction

There is no detailed experimental analysis of the optical reflection properties of epitaxial graphene in the THz-MIR ranges. We report an experimental study of the optical reflection of large area epitaxial graphene spanning a broad range of experimental parameters (number of layers, doping level, sample homogeneity). Accurate information on the number of layers, doping level (Fermi energy) and mobility (scattering time) can be obtained by considering simultaneously both the THz and MIR ranges in the analysis. The IR reflection microspectroscopy is used to extract spatially-resolved information, on the scale of several tens of micrometers, so that it can be used as a reliable non-destructive probe to map the homogeneity of the relevant material properties on wafer-scale graphene

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