Tension-Induced Localized Wrinkling in a Patched Thin Film Supported by an Elastomer.

Abstract

The wrinkling behavior of thin films has received great attention for their applications in developing various wrinkle-based novel technologies. Herein, a new wrinkling system: tension-induced wrinkling in an elastomer-supported patched thin film (TW-P&SF) is investigated by using PDMS-supported patched polyimide thin films with different thicknesses and varied length/width ratios. Different from the well-studied compression-induced wrinkling in an elastomer-supported thin film (CW-SF) and tension-induced wrinkling in an edge-clamped free-standing thin film (TW-FF), in the system of TW-P&SF, the wrinkles are localized near the edge of the film with a finite length that follows a center-symmetric distribution. It was found that the wrinkle length lmax and the wrinkle period λ scale with the film thickness h as λ ∼ h0.86 and lmax ∼ h-0.79. With the assistance of the two-dimensional shear lag model and scaling analysis, the underlying mechanism for wrinkle localization is clarified. Furthermore, the promise of the TW-P&SF-enabled wrinkle-based method as a new method for thin film mechanical characterization is demonstrated.