Abstract
Room temperature irradiation of GaSb by 60 keV Ar+-ions at an oblique incidence of 60° leads to simultaneous formation of a nanoporous layer and undulations at the interface with the underlying substrate. Interestingly, with increasing ion fluence, a gradual embedding of the dense nanoporous layer takes place below ridge-like structures (up to the fluence of 1 × 1017 ions cm−2), which get extended to form a continuous layer (at fluences ≥4 × 1017 ions cm−2). Systematic compositional analyses reveal the co-existence of Ga2O3 and Sb2O3 in the surface layer. The results are discussed in terms of a competition between ion-induced defect accumulation and re-deposition of sputtered atoms on the surface.
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