Abstract
A nanoporous organically modified silicate (ORMOSIL) film with adjustable refractive index from 1.21 to 1.10 was prepared at room temperature via a template-free sol–gel method, using tetraethoxysilane (TEOS) and methyltriethoxysilane (MTES) as co-precursors and hexamethylisilazane (HMDS) as surface modifier. Heating the ORMOSIL film, the refractive index of the ORMOSIL film can be further decreased to as low as 1.07. This adjustable refractive index thin film can find potential application in optical and microelectronic fields.
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