Abstract
Electrodeposition of Si has gained interest recently due to the relative simplicity of electrochemical processing over conventional methods of Si deposition. In this report, we present our progress in the development of Si nanowire arrays electrodeposited from SiCl4 in an ionic liquid electrolyte, specifically tri-methylhexyl ammonium (TMHA+) bis(trifluorosulfonyl) amide (TFSA-). Characterization of deposition conditions for nanowires, as well as preliminary results for electrochemical quartz crystal microbalance (EQCM) measurements of planar deposits are discussed as part of our effort to further the understanding of the reaction mechanisms in Si electrodeposition in ionic liquid.
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