Abstract
A new methodology is developed for the fabrication of nanostructures on substrate based on anodized Al2O3(AAO) porous template transfer process. It includes (1) forming amorphous alloy, negative UV-resist resin (i.e., SU-8), or PMMA (polymethylmethacrylate) plate nanorod arrays by hot-press molding amorphous alloy, negative UV-resist resin (i.e., SU-8), or PMMA plate into the anodized Al2O3porous substrates; (2) removing AAO templates by chemical etching process after suitable posttreatment (annealing and/or irradiation) to improve the mechanical strength of the nanorod arrays; (3) reforming nanopore films by hot-embossing the nanorod arrays into a thin layer of polymer film on substrates (e.g., silica); (4) cleaning the bottom residues in pores of the films by oxygen plasmon. The results indicate that the diameters of amorphous alloy (or negative UV-resist resin or PMMA) nanorod arrays can be ranged from 32 nm to 200 nm. The diameters of the imprinted ILR-1050 photoresist nanopores are about 94.5 ± 12.2 nm and the diameters of the imprinted or SU-8 resin on glass slides nanopores are about 207 ± 26.4 nm, which inherit the diameters of AAO templates. This methodology provides a general method to fabricate nanorods arrays and/or thin nanopore films by template transfer nanoimprint process.
Highlights
Nanostructural materials with defined size, shapes, and structures have shown unique properties for advanced applications [1,2,3,4]
In the template transfer process, the cleaned anodized Al2O3 (AAO) template covered with Pt-based amorphous alloy plate is preheated at the temperature between Tg and Tx (i.e., 533 K)
If the aspect ratio of the nanorods is low (
Summary
Nanostructural materials with defined size (from 1 nm to 1000 nm), shapes (e.g., triangle, square, or pores), and structures (e.g., monolayer, multilayers, and hierarchical arrays) have shown unique properties for advanced applications [1,2,3,4]. Controlled fabrication of nanostructural materials at large scale is the base for their applications For this goal, lots of methods have been developed, such as nanoimprint, template fabrication, lithography using electron beam, ion beam, X-ray beam, and laser beam. Most of the templates are disposable and the nanoimprint process in which we use the master molds made of traditional materials does not improve replicability, which significantly affect the stability and reliability of the final products It is well-known that amorphous metals and thermalsetting polymers are intrinsically free from grain size limitations and they are robust enough [8, 19,20,21,22,23]. A new method termed as template transfer nanoimprint is developed for the fabrication of nanostructures on substrate based on AAO template transfer process in which a kind of amorphous metal alloy (i.e., Ptbased amorphous alloy) or a kind of robust epoxy resin photoresist (i.e., SU-8) is used
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