Abstract
A novel procedure to generate stable and rigid metal nanowire arrays with diameters between 100 and 600 nm and densities of ∼108 cm−2 is presented. It combines 1.(a) pulsed-laser deposition of an adherent and homogeneous gold cathode foil on a polycarbonate track-etch template2.(b) reinforcement and levelling by electroplating, and3.(c) the potentiostatic growth of the nanowire array through the etch tracks under convection control in an electrochemical jet cell.
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